▎ 摘　　要

NOVELTY - Exfoliation of graphene involves irradiating substrate (s1) comprising graphene on surface by hydrogen or helium plasma comprising energy ions of between 10 eV and 60 eV. USE - Exfoliation of graphene during manufacture (claimed). ADVANTAGE - The method enables efficient exfoliation of graphene using helium having excellent chemical stability, and provides high-quality graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of graphene on surface of substrate (s2), which involves transferring substrate (s1) on substrate (s2), after irradiating to form an assembly comprising graphene between the substrates (s1) and (s2), and removing substrate (s1) from the assembly.