▎ 摘　　要

NOVELTY - Forming graphene, comprises: placing a substrate within a reaction chamber; heating the substrate to 600-1100 degrees C; introducing a carbon precursor into the chamber and forming a graphene layer on a surface of the substrate, where the substrate is free of a metal catalyst, and the chamber is free of plasma during the forming step, and the substrate comprises glass or glass-ceramic. USE - The method is useful for forming graphene, or graphene-coated substrate (claimed), which is useful as electrical or thermal conductive substrate, ultracapacitor electrode, or electrical catalyst support. ADVANTAGE - The method: does not utilizes plasma or a metal catalyst (claimed) including copper or nickel; reduces the number of steps, hence minimizes the contamination of or damage to the graphene layer or graphene-substrate interface; and provides the graphene with high quality and yield, and improved conductivity and transparency, in an economical manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene-coated substrate, comprising: a dielectric substrate; and a graphene layer formed in direct contact with a surface of the substrate, where the substrate comprises a glass or glass-ceramic.