• 专利标题:   Forming graphene, useful as e.g. electrical or thermal conductive substrate, comprises placing and heating a substrate within reaction chamber, introducing carbon precursor into chamber, and forming graphene layer on surface of substrate.
  • 专利号:   US2015232343-A1, WO2015126747-A1, TW201538781-A, CN106029080-A, KR2016124832-A, US9505624-B2, EP3107550-A1, JP2017505751-W
  • 发明人:   LIU X, MANLEY R G, MORENA R M, SONG Z
  • 专利权人:   CORNING INC
  • 国际专利分类:   C01B031/04, A61K033/00, C03C017/22, C04B041/85, C23C016/26, C23C016/458, C23C016/46, C04B041/87, H01L021/00, C01B032/15, C01B032/18, C01B032/182
  • 专利详细信息:   US2015232343-A1 20 Aug 2015 C01B-031/04 201558 Pages: 16 English
  • 申请详细信息:   US2015232343-A1 US182819 18 Feb 2014
  • 优先权号:   US182819

▎ 摘  要

NOVELTY - Forming graphene, comprises: placing a substrate within a reaction chamber; heating the substrate to 600-1100 degrees C; introducing a carbon precursor into the chamber and forming a graphene layer on a surface of the substrate, where the substrate is free of a metal catalyst, and the chamber is free of plasma during the forming step, and the substrate comprises glass or glass-ceramic. USE - The method is useful for forming graphene, or graphene-coated substrate (claimed), which is useful as electrical or thermal conductive substrate, ultracapacitor electrode, or electrical catalyst support. ADVANTAGE - The method: does not utilizes plasma or a metal catalyst (claimed) including copper or nickel; reduces the number of steps, hence minimizes the contamination of or damage to the graphene layer or graphene-substrate interface; and provides the graphene with high quality and yield, and improved conductivity and transparency, in an economical manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene-coated substrate, comprising: a dielectric substrate; and a graphene layer formed in direct contact with a surface of the substrate, where the substrate comprises a glass or glass-ceramic.