▎ 摘　　要

NOVELTY - Formation of single layer nitrogen-doped graphene in a plasma-assisted catalytic surface reaction involves (110) depositing nickel film on a substrate, (120) plasma-treating the nickel film, and (130) growing the single layer nitrogen-doped graphene on the plasma treated nickel film using a mixture of chemical compounds in the plasma-assisted catalytic surface reaction. USE - Formation of single layer nitrogen-doped graphene used for electronics, sensor and electronic packaging. ADVANTAGE - The method is efficient, economical, and environmentally-friendly, and provides nitrogen-doped graphene under mild conditions. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart for formation of single layer nitrogen-doped graphene. Deposition process (110) Plasma treating process (120) Plasma assisted catalytic surface reaction (130)