▎ 摘　　要

NOVELTY - The method involves transmitting UV radiation in ozone environment through a mask plate during graphene thin film patterning process. A graphene thin film is prepared. The prepared graphene thin film is fixed with a substrate. Graphene mask plate manufacturing process is performed. A graphene mask plate and the graphene thin film are placed in the ozone environment. The graphene thin film is connected with a metal film. A metal thin film is fixed to a copper foil and an aluminum foil or nickel foil. The graphene mask plate is formed as a quartz glass mask plate or hollow tin paper mask plate. USE - Industrial graphene thin film patterning method. ADVANTAGE - The method enables reducing patterning cost, and improving processing efficiency. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating an industrial graphene thin film patterning method.'(Drawing includes non-English language text)'