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  • 专利标题:   Removing a single graphene layer from a graphene material comprises applying a metal to a surface of the graphene material, and applying a hydrogen containing solution to the surface of the graphene material.
  • 专利号:   WO2012094045-A2, US2013319973-A1, WO2012094045-A3, US9005460-B2
  • 发明人:   TOUR J M, DIMIEV A M, KOSYNKIN D V
  • 专利权人:   UNIV RICE WILLIAM MARSH, UNIV RICE WILLIAM MARSH
  • 国际专利分类:   C01B031/04, B32B009/00, B82Y030/00, B82Y040/00, C03C025/68, H01L021/306, H01L021/308
  • 专利详细信息:   WO2012094045-A2 12 Jul 2012 C01B-031/04 201249 Pages: 36 English
  • 申请详细信息:   WO2012094045-A2 WOUS055747 11 Oct 2011
  • 优先权号:   US391936P, US13878876

▎ 摘　　要

NOVELTY - Removing a single graphene layer from a graphene material, comprises: (a) applying a metal to a surface of the graphene material; and (b) applying a hydrogen containing solution to the surface of the graphene material that is associated with the metal, where the hydrogen containing solution dissolves the metal along with a single layer of graphene associated with the metal, thus removing the single layer of graphene from the graphene material. USE - The method is useful for removing a single graphene layer from a graphene material (claimed). ADVANTAGE - The method is highly improved and effectively removes a single graphene layer from a graphene material.