▎ 摘　　要

NOVELTY - The method comprises: forming (S10) a graphene layer on a catalyst metal layer; attaching (S20) a support layer on the graphene layer; removing (S30) the catalyst metal layer; disposing (S40) a substrate on the graphene layer; and separating (S50) the support layer from the graphene layer by irradiating light to the support layer. The support layer loses adhesion by light, and comprises an optical transfer film. The optical transfer film comprises a base, and a photoreactive adhesive layer. The photoreactive adhesive layer is UV reactive adhesive layer losing adhesion in response to UV light. USE - The method is useful for manufacturing a graphene using an apparatus and light (claimed), where the graphene is useful: as a base material for electronic circuits; and for carbon-based electrical or electronic devices. ADVANTAGE - The method is capable of manufacturing the graphene with improved electrical, mechanical and chemical properties and conductivity in an efficient manner. DETAILED DESCRIPTION - The method comprises: forming (S10) a graphene layer on a catalyst metal layer; attaching (S20) a support layer on the graphene layer; removing (S30) the catalyst metal layer; disposing (S40) a substrate on the graphene layer; and separating (S50) the support layer from the graphene layer by irradiating light to the support layer. The support layer loses adhesion by light, and comprises an optical transfer film. The optical transfer film comprises a base, and a photoreactive adhesive layer. The photoreactive adhesive layer is an UV reactive adhesive layer losing adhesion in response to UV light. The step of separating of the support layer by irradiating light is performed: using a surface light source or a cylindrical light source; by patterning such that the graphene has the pattern; and by irradiating light via laser scanning. One of the catalyst metal layer, the graphene layer, the support layer and the substrate is transported by a roller. The roller comprising the cylindrical light source comprises a contact unit having a transparent portion or a slit. The method further comprises: disposing a pattern mask on the support layer after the step of disposing the substrate on the graphene layer. Non-exposed portions of the graphene by the pattern mask are separated from the substrate along with the support layer. The laser scanning is performed using a scanning mirror. The step of disposing of the substrate on the graphene layer and the step of irradiating of light to the support layer are simultaneously performed. DESCRIPTION OF DRAWING(S) - The diagram shows a flowchart of a method for manufacturing a graphene. Forming a graphene layer on a catalyst metal layer (S10) Attaching a support layer on the graphene layer (S20) Removing the catalyst metal layer (S30) Disposing a substrate on the graphene layer (S40) Separating the support layer from the graphene layer. (S50)