▎ 摘　　要

NOVELTY - A pellicle comprises a two-layer film comprising graphene, silicon, silicon and silicon nitride, silicon and silicon carbide (I), silicon and molybdenum silicon, silicon nitride (II), and molybdenum silicon (III), silicon carbide and molybdenum silicon, silicon and graphene, silicon nitride and graphene, silicon carbide and graphene, molybdenum silicon and graphene, and has transmittance of 80% or more, and thickness of 100 nm or less with respect to extreme UV-light exposure. USE - Pellicle used for extreme UV-lithography for high integration of semiconductor integrated circuits. ADVANTAGE - The pellicle has excellent thermal and chemical stability, while minimizing loss of optical properties, avoids the emission spectrum of the emission layer, reduced reflectance. DETAILED DESCRIPTION - A pellicle comprises a two-layer film comprising graphene, silicon, silicon and silicon nitride, silicon and silicon carbide of formula (I), silicon and molybdenum silicon, silicon nitride of formula (II), and molybdenum silicon of formula (III), silicon carbide and molybdenum silicon, silicon and graphene, silicon nitride and graphene, silicon carbide and graphene, molybdenum silicon and graphene, and has transmittance of 80% or more, and thickness of 100 nm or less with respect to extreme UV-light exposure. Silicon carbide, silicon nitride, and molybdenum silicon of formulae: SiCx (I), SiNx (II), and MoSix (III), where x is 0-2. An INDEPENDENT CLAIM is included for formation of the pellicle.