• 专利标题:   Flexible substrate based high-frequency graphene electromechanical resonator manufacturing method for microwave device, involves performing graphene suspension process on gate metal electrode to form graphene beam.
  • 专利号:   CN103296991-A, CN103296991-B
  • 发明人:   XU R, SUN Y, XU Y, LI O
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   H03H003/02, H03H009/15
  • 专利详细信息:   CN103296991-A 11 Sep 2013 H03H-009/15 201377 Chinese
  • 申请详细信息:   CN103296991-A CN10157420 28 Apr 2013
  • 优先权号:   CN10157420

▎ 摘  要

NOVELTY - The method involves arranging a gate metal electrode (4) on a flexible substrate (1) during evaporation process. A surface of the flexible substrate is adhered with a metal titanium layer and a gold-molybdenum alloy layer. A silicon dioxide medium layer (2) is deposited on the flexible substrate during plasma-enhanced chemical vapor deposition process. The gate metal electrode is embedded on the silicon dioxide medium layer. A metal electrode layer (5) is adhered on a drain metal electrode (6). Graphene suspension process is performed on the gate metal electrode to form a graphene beam (3). USE - Flexible substrate based high-frequency graphene electromechanical resonator manufacturing method for a microwave device. ADVANTAGE - The method enables increasing quality factor and shock resistance and reducing operation cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a high-frequency graphene electromechanical resonator. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of a high-frequency graphene electromechanical resonator. Flexible substrate (1) Silicon dioxide medium layer (2) Graphene beam (3) Gate metal electrode (4) Metal electrode layer (5) Drain metal electrode (6)