• 专利标题:   Controlling stress of amorphous carbon film, comprises depositing first amorphous carbon layer on substrate, and stacking graphene layer on amorphous carbon layer, and depositing second amorphous carbon layer on graphene and carbon layer.
  • 专利号:   KR2023014330-A
  • 发明人:   KIM K
  • 专利权人:   UNIV DAEJEON IND COOP FOUND
  • 国际专利分类:   C01B032/182, C23C016/26, H01L021/02, H01L021/033
  • 专利详细信息:   KR2023014330-A 30 Jan 2023 H01L-021/033 202316 Pages: 13
  • 申请详细信息:   KR2023014330-A KR095557 21 Jul 2021
  • 优先权号:   KR095557

▎ 摘  要

NOVELTY - Controlling stress of amorphous carbon film, comprises (a) preparing a substrate, (b) depositing a first amorphous carbon layer on the substrate, (c) stacking a graphene layer on the first amorphous carbon layer, and (d) depositing a second amorphous carbon layer on the graphene layer and the first amorphous carbon layer, where the stress of the amorphous carbon film composed of the first amorphous carbon layer, the graphene layer, and the second amorphous carbon layer is physically controlled, as the step (c) is performed. USE - The method is useful for controlling stress of amorphous carbon film. ADVANTAGE - The method can be used graphene layer composed of clusters having relatively high strength and toughness without changing the process by applying single layer or multiple layers between first and second amorphous carbon layers, shorten process time, and reduces cost of the process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for amorphous carbon film whose stress is controlled by the stress control method. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for controlling stress of amorphous carbon film (Drawing includes non-English language text).