▎ 摘　　要

NOVELTY - The device (1) has heating portion (11) that is provided with uncoiler (30). A gas is supplied to pass through uncoiler to substrate which is maintained at annealing temperature in deposition chamber (20). The step type chamber, deposition chamber and coiler (40) are arranged in specific direction. The walls of deposition chamber and receiving chamber are arranged adjacent to each other. The supplied gas is nitrogen, neon, argon, krypton, xenon, carbon monoxide, carbon dioxide, nitrogen oxide, ammonia, and steam. USE - Cyclic type graphene manufacturing device. ADVANTAGE - The structure of the device is simplified. The ventilation and thermal efficiency of the device are improved. The catalytic action in the deposition chamber is improved. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the cyclic type graphene manufacturing device. Cyclic type graphene manufacturing device (1) Heating portion (11) Deposition chamber (20) Uncoiler (30) Coiler (40)