▎ 摘　　要

NOVELTY - The device has a base (2) that is positioned below the stirred tank (1). The outer side of the stirred tank is welded with four support rods (3). The support rod is extended away from one end of the stirred tank into the corresponding mounting hole (5) and is welded with the support seat (4). The two sliders on the same side are welded to the limit rods on the sides close to each other. The limiting rod is slidably mounted in the corresponding limiting slot. The top end of the lead screw is extended through the corresponding first hole and extended above the base. The lead screw is rotatably connected to the corresponding first hole. The bottom end of the screw is rotatably mounted with an adjustment seat whose top portion is in contact with the bottom of the base. USE - Graphene processing device. ADVANTAGE - The device has reasonable design and convenient regulation, and is convenient for installing the stirred tank on the base. The level of the base is adjusted by adjusting the length of the screw sticking out of the base to ensure that the stirred tank has a good level and is convenient for use. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of using graphene processing device. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of the graphene processing device. Stirred tank (1) Bas (2) Support rod (3) Support seat (4) Mounting hole (5)