▎ 摘　　要

NOVELTY - Manufacturing graphene thin film for pellicle material using ozone gas comprises forming graphene on the upper surface of the substrate, exposing the graphene layer formed through the graphene forming step to ozone, and heat-treating and etching the ozonated graphene layer through the ozone treatment step. In the ozone treatment step, the graphene layer formed through the graphene forming step is exposed to ozone for 10-600 seconds at a temperature of 100-400° C in oxygen mixed gas atmosphere. USE - The graphene thin film for pellicle material is useful in semiconductor devices and electronic devices. ADVANTAGE - The graphene thin film has excellent extreme ultraviolet (EUV) transmittance and uniformity. The method prevents damage to graphene layer; maintains mechanical strength; exhibits excellent extreme ultraviolet transmittance and uniformity.