▎ 摘　　要

NOVELTY - Epitaxy structure (1000) comprises a substrate (101) having an upper surface, the upper surface having a single crystal structure, a two-dimensional material layer (103) provided on the upper surface of the substrate, and multiple of nanorod light emitting devices (100) provided on an upper surface of the two-dimensional material layer. The multiple of nanorod light emitting devices having a nanorod shape extending in a vertical direction, where multiple of nanorod light emitting devices comprising a light emitting nanorod, and a passivation film provided adjacent to a sidewall of the light emitting nanorod, the passivation film having insulation. USE - Epitaxy structure. ADVANTAGE - The epitaxy structure including multiple of nanorod light emitting devices having a high-quality single crystal structure. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a monolithic optical integrated circuit comprises an epitaxy structure comprising a substrate having an upper surface that has a single crystal structure, an insulating layer provided on the upper surface of the substrate, multiple of two-dimensional material layers provided on the upper surface of the substrate, and multiple of two-dimensional material layers being electrically isolated from each other by the insulating layer. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a method of manufacturing an epitaxy structure including multiple of nanorod light emitting devices. 100Nanorod light emitting devices 101Substrate 103Two-dimensional material layer 110Light emitting nanorods 1000Epitaxy structure