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  • 专利标题:   Apparatus for graphene wet transfer comprises reservoir body having reservoirs, barrier structure which is located on reservoir and has separated space formed by barriers, and substrate frame which is located below barrier structure.
  • 专利号:   US2017028692-A1, KR2017014489-A, KR1860019-B1, US9994007-B2
  • 发明人:   KIM C, LEE S, KIM J H, LEE T, SEO M, CHOI J, JHON Y M, WOO D H, LIM C
  • 专利权人:   KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   B32B037/00, B41F016/00, B41F035/00, C01B031/04, B05C003/09, B05C003/10, B05C003/109, B05D001/20, C01B032/184
  • 专利详细信息:   US2017028692-A1 02 Feb 2017 B32B-037/00 201713 Pages: 13 English
  • 申请详细信息:   US2017028692-A1 US044586 16 Feb 2016
  • 优先权号:   KR107955

▎ 摘　　要

NOVELTY - An apparatus (100) comprises reservoir body (110) having greater than or equal to 2 reservoirs, barrier structure (120) which is located on reservoir and has greater than or equal to 1 separated space formed by barriers, and substrate frame (130) which is located below barrier structure and has greater than or equal to 1 substrate accommodation groove for accommodating target substrate to which graphene is transferred. Each reservoir is filled with solution for wet transfer process, and graphene is separately located in each separated space in floating state in solution. USE - An apparatus for graphene wet transfer (claimed). ADVANTAGE - Graphene is protected against external force artificially generated during wet transfer process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a graphene wet transfer process which involves etching catalyst metal bonded to lower surface of graphene by locating barrier structure (120) on 1st reservoir filled with etching solution and locating graphene separately in each separated space of barrier structure in floating state in etching solution, washing etching solution by horizontally moving barrier structure from 1st reservoir onto 2nd reservoir filled with washing solution, and transferring graphene to corresponding target substrate by locating substrate frame (130) accommodating greater than or equal to 1 target substrate on 1st reservoir filled with washing solution, horizontally moving barrier structure from 2nd reservoir onto substrate frame of 1st reservoir, and discharging washing solution from 1st reservoir in which graphene is separately located in each separated space in floating state in etching solution or washing solution while barrier structure is moving from 1st reservoir to 2nd reservoir or from 2nd reservoir to 1st reservoir. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the apparatus for graphene wet transfer. Apparatus (100) Reservoir body (110) Barrier structure (120) Substrate frame (130) Moving mechanism (140) Level control pipe (150)