• 专利标题:   FET comprises substrate layer, graphene channel layer, source/drain electrodes, gate dielectric layer, semiconductor layer provided without contacting source/drain electrodes, and grid electrode.
  • 专利号:   CN110323277-A
  • 发明人:   XU H, XIAO X, LI W
  • 专利权人:   HUAWEI TECHNOLOGIES CO LTD
  • 国际专利分类:   H01L021/336, H01L029/06, H01L029/16, H01L029/78
  • 专利详细信息:   CN110323277-A 11 Oct 2019 H01L-029/78 201990 Pages: 21 Chinese
  • 申请详细信息:   CN110323277-A CN10264930 28 Mar 2018
  • 优先权号:   CN10264930

▎ 摘  要

NOVELTY - An FET comprises a substrate layer, a graphene channel layer provided on the substrate layer, and a source electrode and a drain electrode provided on the upper surface of the graphene channel layer, with a space between, a gate dielectric layer provided on the upper surface of the graphene channel layer and between the source and drain electrodes, a semiconductor layer provided on the upper surface of the gate dielectric layer, without contacting the source and drain electrodes, and a grid electrode provided on the upper surface of the semiconductor layer. USE - FET. ADVANTAGE - The FET has improved saturation current characteristics, retains graphene mobility characteristics, and can be prepared easily on a large scale. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of the FET.