▎ 摘　　要

NOVELTY - The method involves transferring first sub-group of graphene materials to a transparent substrate to test the uniformity of first sub-group of graphene materials. The first sub-group of graphene materials transferred to transparent substrate using characterizing graphene materials. The light of lamp is emitted at a wavelength, by striking and passing through transparent substrate and graphene materials. The characterization of graphene formulation from an amount of light calculated at known wavelength. USE - Method for processing uniformity testing of semiconductor substrates for use during manufacture of semiconductor device. Uses include but not limited to integrated circuits (IC) device, microelectromechanical system (MEMS), nanoelectromechanical system (NEMS), flat panel display, optoelectronic device, data storage device, magneto electronic device, magneto optic device, packaged device and solar device. ADVANTAGE - The manufacturing cost of the semiconductor substrate can be reduced effectively and the productivity of the semiconductor substrate can be improved. The efficiency offered through the combinatorial processing operations of semiconductor substrate can be improved. The grapheme can be uniformly deposited, since the first sub-group of graphene materials are transferred to transparent substrate using characterizing graphene materials. The characterization of the combinatorial test substrates can be processed quickly. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for system for calculating graphene uniformity of graphene sheet. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the combinatorial screening process of semiconductor substrate. Combinatorial screening unit (100) Primary screening unit (110) Secondary screening unit (120) Tertiary screening unit (130)