• 专利标题:   Graphene deposition device comprises machine body provided with containing cavity, vacuum cavity located in containing cavity, and reaction cavity located in vacuum cavity, where reaction cavity is provided with heating component and bearing plate.
  • 专利号:   CN211689227-U
  • 发明人:   SUN Q, MENG Y, DING M, JIA C, FENG H
  • 专利权人:   BEIJING NANOENERGY NANOSYSTEMS INST
  • 国际专利分类:   C23C016/26, C23C016/52
  • 专利详细信息:   CN211689227-U 16 Oct 2020 C23C-016/26 202089 Pages: 11 Chinese
  • 申请详细信息:   CN211689227-U CN22187923 09 Dec 2019
  • 优先权号:   CN22187923

▎ 摘  要

NOVELTY - The utility model claims a graphene preparation field, claims a graphene deposition device. The graphene deposition device comprises: a machine body, provided with a containing cavity, a vacuum cavity in the containing cavity, and a reaction cavity located in the vacuum cavity; the reaction cavity is provided with a heating component and a bearing plate located above the heating component; the interior of the bearing plate is uniformly provided with a plurality of temperature sensors; wherein the reaction cavity comprises a heat preservation wall set on the bottom plate of the vacuum cavity and a heat preservation cover set above the bearing plate and closed with the top of the heat preservation wall; the vacuum cavity is connected with the reaction cavity air path and is a cuboid structure. Using the device can solve the problem that the existing graphene deposition device because the reaction chamber temperature is not uniform, the product quality percent of pass is low.