• 专利标题:   Method of transferring graphene layer provides a method for transferring graphene layer.
  • 专利号:   TW201509795-A
  • 发明人:   LIN W, CHEN T, SU W, WU C, CHANG C, LEE W
  • 专利权人:   ACAD SINICA, UNIV TAIWAN NAT
  • 国际专利分类:   B32B038/10, B32B038/18, C01B031/04
  • 专利详细信息:   TW201509795-A 16 Mar 2015 C01B-031/04 201542 Pages: 0 Chinese
  • 申请详细信息:   TW201509795-A TW131632 03 Sep 2013
  • 优先权号:   TW131632

▎ 摘  要

NOVELTY - The present invention provides a method for transferring graphene layer, comprising following steps: (a) providing a support frame; (b) providing the support frame into an etching solution; (c) providing a first substrate with the graphene layers into the support frame to perform etching; (d) replacing the etching solution with a aqueous solution; (e) providing a second substrate into the aqueous solution; and (f) transferring the graphene layer on the second substrate. The method of the present invention is free of any polymer materials as a supporting layer. The method does not merely avoid remaining polymer materials on the graphene layer, but the product still also has excellent material properties.