• 专利标题:   Flexible hollow mask plate useful in micro-nano processing field, comprises polyvinyl alcohol and carbon material.
  • 专利号:   CN113046685-A, CN113046685-B
  • 发明人:   YANG H, WANG X, WANG S, CHEN S, LIU Q
  • 专利权人:   NAT CENT NANOSCIENCE TECHNOLOGY CHINA
  • 国际专利分类:   C23C014/04, G03F007/20
  • 专利详细信息:   CN113046685-A 29 Jun 2021 C23C-014/04 202161 Pages: 12 Chinese
  • 申请详细信息:   CN113046685-A CN10262183 10 Mar 2021
  • 优先权号:   CN10262183

▎ 摘  要

NOVELTY - Flexible hollow mask plate comprises polyvinyl alcohol and carbon material. USE - The plate is useful in micro-nano processing field (claimed). ADVANTAGE - The plate: can be flexibly covered on the substrate; realizes the deposition preparation of the electrode material on the micro-nano scale; has free of environment method; avoids affecting the performance of the substrate material and structure; has simple preparation method and low cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing the flexible hollow mask plate.