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  • 专利标题:   Processing graphene inert substrate for coordination assembling comprises immersing the graphene in hydrogen ion and manganese heptoxide aqueous solution.
  • 专利号:   CN103373721-A
  • 发明人:   QIU X, WANG X, WANG R, WANG S
  • 专利权人:   NAT CENT NANOSCIENCE TECHNOLOGY CHINA
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN103373721-A 30 Oct 2013 C01B-031/04 201412 Pages: 9 Chinese
  • 申请详细信息:   CN103373721-A CN10107475 12 Apr 2012
  • 优先权号:   CN10107475

▎ 摘　　要

NOVELTY - Processing graphene inert substrate for coordination assembling comprises immersing the graphene in 8-10 mol/l of hydrogen ion and 0.016-0.4 wt.% of manganese heptoxide aqueous solution. USE - The method is useful for processing graphene inert substrate for coordination assembling (claimed).