• 专利标题:   Method for preparing low-friction wear-resistant nano-crystal graphene film, involves performing laser direct-writing processing to polyimide film.
  • 专利号:   CN113998690-A, CN113998690-B
  • 发明人:   DIAO D, HUANG Z, CHEN C
  • 专利权人:   UNIV SHENZHEN
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN113998690-A 01 Feb 2022 C01B-032/184 202268 Chinese
  • 申请详细信息:   CN113998690-A CN11084349 16 Sep 2021
  • 优先权号:   CN11084349

▎ 摘  要

NOVELTY - The method involves providing polyimide glue and substrate. The polyimide glue solution is coated on the substrate, and after curing, a polyimide film is obtained. The polyimide film is processed by laser direct writing to obtain a nanocrystalline graphene film with low friction and wear resistance. USE - Method for preparing a low-friction wear-resistant nano-crystal graphene film. ADVANTAGE - The method has simple technique, convenient operation, low cost, without special environment and gas condition, capable of quickly and efficiently preparing nano-crystal graphene film with low friction and wear-resistant performance, and has long abrasion service life under 20N high load, and wide application prospect in the friction field. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a nano-crystal graphene film with low friction and abrasion resistance. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a method for preparing a low-friction wear-resistant nano-crystal graphene film.(Drawing includes non-English language text)