▎ 摘　　要

NOVELTY - The pellicle has a pellicle frame (120) for supporting a pellicle membrane (110) that comprises a carbon nanomaterial and a silicon-based binder, where thickness of the membrane is about 0.1 nm or more and 100 nm or less. The carbon nanomaterial comprises carbon nanotube (CNT) and graphene. The silicon-based binder comprises siloxane. USE - Pellicle for EUV for protecting photo-mask from external contamination during photolithography process. ADVANTAGE - The pellicle has high EUV transmittance, excellent rigidity and heat dissipation. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for manufacturing a pellicle. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the pellicle. 110Pellicle membrane 120Pellicle frame