• 专利标题:   Method for forming graphene layer used for element fabrication, involves forming laminated structure comprising graphite catalyst thin film and amorphous carbon thin film on substrate, thermally treating and removing catalyst thin film.
  • 专利号:   KR2011064154-A, KR1122676-B1
  • 发明人:   KIM K B, KIM H M
  • 专利权人:   SNU R DB FOUND
  • 国际专利分类:   B32B009/00, C01B031/04
  • 专利详细信息:   KR2011064154-A 15 Jun 2011 201224 Pages: 11
  • 申请详细信息:   KR2011064154-A KR120638 07 Dec 2009
  • 优先权号:   KR120638

▎ 摘  要

NOVELTY - A laminated structure comprising a graphite catalyst thin film (240) and amorphous carbon thin film (230) is formed on a substrate (210). The laminated structure is thermally treated to form another laminated structure, and the film (240) is removed to obtain graphene layer. USE - Method for forming graphene layer used for element fabrication. ADVANTAGE - The graphene layer is manufactured by a simple process without requiring the process of moving the graphene to a substrate. DESCRIPTION OF DRAWING(S) - The drawing shows the sectional view of the graphene layer. Substrate (210) Amorphous carbon thin film (230) Graphite catalyst thin film (240)