• 专利标题:   Preparation of conformal graphene for power supply, involves spin coating epoxy-based negative photoresist on glass, pre-baking, using femtosecond laser oscillator for processing, spin coating graphene oxide solution, and post-baking.
  • 专利号:   CN111151872-A
  • 发明人:   ZHANG Y, CHEN Z, HAN D, SUN H
  • 专利权人:   UNIV JILIN
  • 国际专利分类:   B23K026/046, B23K026/0622, B23K026/064, B23K026/082, B23K026/70
  • 专利详细信息:   CN111151872-A 15 May 2020 B23K-026/0622 202047 Pages: 12 Chinese
  • 申请详细信息:   CN111151872-A CN10045428 16 Jan 2020
  • 优先权号:   CN10045428

▎ 摘  要

NOVELTY - Preparation of conformal graphene involves (1) spin coating SU-8 (epoxy-based negative photoresist) on glass at speed of 500-3000 rps for 60-180 seconds, pre-baking at 60-90 degrees C for 60-90 minutes, focusing femtosecond laser oscillator on SU-8 photoresist for processing, exposing for 500-1000 mu s, post-baking at 70-100 degrees C for 10-30 minutes, developing with acetone solution for 30-120 seconds, obtaining three-dimensional nanostructures, (2) spin coating 2-10 mg/mL graphene oxide solution onto the above three-dimensional nanostructure at pin coating speed of 500-3000 rps for 60-180 seconds, drying in air for 6-8 hours, obtaining three-dimensional nanostructure of graphene oxide, (3) focusing femtosecond laser oscillator on graphene oxide film for processing, adjusting the position of the processing platform to achieve the focus of the oscillator pulse at different heights, and exposing for 100-1000 microseconds. USE - Preparation of conformal graphene for power supply (claimed). DETAILED DESCRIPTION - Preparation of conformal graphene involves (1) spin coating SU-8 photoresist on glass at speed of 500-3000 rps for 60-180 seconds, pre-baking at 60-90 degrees C for 60-90 minutes, using femtosecond laser oscillator for processing, using oil immersion objective lens with a numerical aperture of 1.35 and a magnification of 100, focusing femtosecond laser oscillator (center wavelength is 780 nm, pulse duration of 120 fs) on SU-8 photoresist for processing, adjusting the position of the processing platform to achieve the focus of the oscillator pulse at different heights, exposing for 500-1000 mu s, post-baking at 70-100 degrees C for 10-30 minutes, developing with an acetone solution for 30-120 seconds, obtaining three-dimensional nanostructures, (2) spin coating 2-10 mg/mL graphene oxide solution onto the above three-dimensional nanostructure at pin coating speed of 500-3000 rps for 60-180 seconds, drying in air for 6-8 hours, obtaining three-dimensional nanostructure of graphene oxide, (3) using femtosecond laser oscillator to process the three-dimensional nanostructure of the spin-coated graphene oxide, using an oil immersion objective lens with a numerical aperture of 1.35 and a magnification of 100, focusing femtosecond laser oscillator (center wavelength is 780m, pulse duration of 120 fs) on graphene oxide film for processing, adjusting the position of the processing platform to achieve the focus of the oscillator pulse at different heights, and exposing for 100-1000 microseconds.