• 专利标题:   ROLL-TYPE CVD REACTOR from the gas phase for chemical deposition of thin graphene films.
  • 专利号:   RU2762700-C1
  • 发明人:   SMOVZH D V, MATOCHKIN P E, BEZRUKOV I A, KRIVENKO A S
  • 专利权人:   AS SIBE KUTATELADZE THERMO PHYS INST, EPOSENG CO LTD
  • 国际专利分类:   C01B032/182, C01B032/00, C01B032/194, B82B003/00
  • 专利详细信息:   RU2762700-C1 22 Dec 2021 C01B-032/182 202209 Pages: 0 Russian
  • 申请详细信息:   RU2762700-C1 RU141863 18 Dec 2020
  • 优先权号:   RU141863

▎ 摘  要

NOVELTY - Invention relates to a class of roll reactors for chemical deposition of thin graphene films from the gas phase. In order to continuously synthesise graphene, a roll-type CVD reactor is used, including a vacuum working chamber with a heat-insulated heating area, one or several, a system of temperature controllers, a substrate moving system, a gas supply system, and a vacuum pumping system. The heat-insulated heating area and the system for moving the strip substrate are located inside the vacuum chamber, thus preventing the contact of the metal substrate with the graphene layer applied thereon with the atmosphere until complete cooling. USE - Chemical processes. ADVANTAGE - Creation of a compact apparatus for synthesising high-quality coatings on substrates in the form of a wide strip. 4 cl, 4 dwg