▎ 摘　　要

NOVELTY - A processing device (100) consists of a processing container (101), a mounting table (102) on which a substrate is placed in the container, and control unit (106). The container has a thermal sprayed ceramic coating on an inner wall where the antenna that radiates microwaves is placed and accommodates the substrate. The control unit performs a precoating step of coating the surface of the thermal sprayed ceramic coating with a carbon film (F1) with plasma of a carbon-containing gas (G1) at a pressure (P1), and a film forming step of forming a carbon film (F2) on the substrate with a plasma of a carbon-containing gas (G2) at a pressure (P2). USE - Processing device for forming film (claimed). ADVANTAGE - The device reduces the generation of particles. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for formation of film using plasma. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the processing device. Processing device (100) Processing container (101) Mounting table (102) Exhaust apparatus (104) Control unit (106)