• 专利标题:   Manufacture of metal inductor for wireless communication application, involves forming lower metal layer and insulating dielectric layer, etching, depositing diffusion barrier layer and metal seed layer, and growing graphene layer.
  • 专利号:   CN102709155-A, CN102709155-B
  • 发明人:   FU Y, HUANG R, LI C, REN L, WEI Q, WEI Z, ZHANG X, ZHOU M
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   H01L021/02
  • 专利详细信息:   CN102709155-A 03 Oct 2012 H01L-021/02 201304 Pages: 9 Chinese
  • 申请详细信息:   CN102709155-A CN10112738 17 Apr 2012
  • 优先权号:   CN10112738

▎ 摘  要

NOVELTY - A lower metal layer is formed and an insulating dielectric layer is deposited on the metal layer and etched to form through holes for inductor port. A diffusion barrier layer and metal seed layer are deposited on the through holes to obtain a metal induction coil. A graphene layer is grown on the surface of the coil to obtain metal inductor. USE - Manufacture of metal inductor for wireless communication application. ADVANTAGE - The metal inductor improves the electromigration resistance and lifetime of the coil, reduces performance degradation and overall copper interconnection due to electromigration phenomenon, has excellent thermal conductivity, and eases the inductance coil local temperature fusing or dielectric breakdown phenomenon.