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  • 专利标题:   Wire structure and manufacturing method thereof, includes a metal layer and a graphene layer being close to a side wall and bottom of an outer periphy on portion of the metal layer.
  • 专利号:   TW201606932-A, TW618188-B1
  • 发明人:   SU Y, WU C, CHEN C, LIU C, SU Y W, WU C S, CHEN C D, LIU C H
  • 专利权人:   NAT APPLIED RES LAB, UNIV NAT CHANGHUA EDUCATION, ACAD SINICA
  • 国际专利分类:   H01L021/288, H01L021/768
  • 专利详细信息:   TW201606932-A 16 Feb 2016 H01L-021/768 201638 Pages: 0 Chinese
  • 申请详细信息:   TW201606932-A TW127812 13 Aug 2014
  • 优先权号:   TW127812

▎ 摘　　要

NOVELTY - This invention provide a wire structure and a manufacturing method thereof. The wire structure comprising a metal layer and a graphene layer being close to a side wall and bottom of an outer periphy on portion of the metal layer. The metal layer is produced by electroplating using the graphene layer as a seed layer.