▎ 摘　　要

NOVELTY - A silicon substrate is cleaned and carbonized layer is formed using propane. Propane and silane are formed into carbon-silicon carbide epitaxial film and carbon ions are injected into the film using a mask. Argon gas is supplied to the film and a carbon film is formed. Nickel film is deposited on the substrate, and the produced carbon film is placed on the nickel film. The substrate with the film is annealed to form modified nano ribbon. The nickel film is separated from the nano ribbon and nano material comprising separating bands and nano ribbons, is formed. USE - Manufacture of nickel film-containing graphene nano ribbon. ADVANTAGE - The nickel film-containing graphene nano ribbon having smooth surface is formed safely and economically at low pyrolysis temperature. DETAILED DESCRIPTION - A silicon substrate is cleaned and heated to 1000-1200 degrees C under protection of hydrogen. Propane is supplied to the substrate and carbonized layer is formed. Propane and silane are formed into carbon-silicon carbide epitaxial film. A mask comprising ion separating band with width of 100-200 nm and ion injection band with width of 50-200 nm is formed. Carbon ions are injected into the epitaxial film and heated. Argon gas is supplied to the film and a carbon film is formed. Nickel film is deposited on the substrate to a thickness of 300-500 nm, and the produced carbon film is placed on the nickel film. Argon gas is supplied to the substrate and the substrate with the film is annealed at 900-1200 degrees C to form modified nano ribbon. The nickel film is separated from the nano ribbon and nano material comprising separating bands and nano ribbons alternately, is formed.