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  • 专利标题:   Preparing nitrogen-doped graphene quantum dot involves keeping triaminotrinitrobenzene in muffle furnace under nitrogen protection to perform pyrolysis reaction.
  • 专利号:   CN104861967-A, CN104861967-B
  • 发明人:   LI R, LIU Y, YANG G, YANG Y, SHEN J
  • 专利权人:   INST CHEM MATERIAL CHINA ACAD ENG PHYSIC, SICHUAN NEW MATERIALS RES CENT, SICHUAN NEW MATERIALS RES CENT
  • 国际专利分类:   C09K011/65, G01N021/64
  • 专利详细信息:   CN104861967-A 26 Aug 2015 C09K-011/65 201601 Chinese
  • 申请详细信息:   CN104861967-A CN10175000 14 Apr 2015
  • 优先权号:   CN10175000

▎ 摘　　要

NOVELTY - Preparing nitrogen-doped graphene quantum dot involves keeping triaminotrinitrobenzene in a muffle furnace under nitrogen protection to perform pyrolysis reaction at 400-1000 degrees C for 10-360 minutes and then cooling the reacted material to room temperature to obtain nitrogen-doped graphene quantum point doped polymer. The obtained product is kept in mixed acid of concentrated sulfuric acid and nitric acid. The obtained material is stirred at 90-120 degrees C for 20-30 hours and then the stirred material is added with water and sodium carbonate for regulating pH to 7. The obtained material is dialyzed. USE - Method for preparing nitrogen-doped graphene quantum dot (claimed). ADVANTAGE - The method enables to prepare nitrogen-doped graphene quantum dot in cost-effective manner, and with excellent light-emitting property.