• 专利标题:   Quantum dot doped organic resistance variable memory based graphene preparing method, involves forming organic functional layer, dielectric layer on substrate to form bottom electrode, and arranging device layer on another substrate.
  • 专利号:   CN103035842-A, CN103035842-B
  • 发明人:   CHEN W, WU X, LI F, HU X, GUO T, KOU L, WU C
  • 专利权人:   UNIV FUZHOU
  • 国际专利分类:   H01L051/05, H01L051/40
  • 专利详细信息:   CN103035842-A 10 Apr 2013 H01L-051/05 201363 Pages: 6 Chinese
  • 申请详细信息:   CN103035842-A CN10000243 04 Jan 2013
  • 优先权号:   CN10000243

▎ 摘  要

NOVELTY - The method involves forming an organic functional layer and a dielectric layer on a substrate to form a bottom electrode. A device layer is arranged on another substrate to form a top electrode. An organic functional layer is provided with polymer graphene quantum dots on the bottom electrode to form a film. The substrate is made of a glass, quartz, ceramic or flexible material. The bottom electrode is made of a metal, copper, tungsten, nickel, zinc, aluminum, tin-doped indium oxide, zinc oxide or silicon material. The top electrode is made of copper or silver. USE - Quantum dot doped organic resistance variable memory based graphene preparing method. ADVANTAGE - The method enables simplifying a process, ensuring better repeatability and stability and improving response speed and application value. DESCRIPTION OF DRAWING(S) - The drawing shows a side view of a quantum dot doped organic resistance variable memory based graphene.