• 专利标题:   Device used for processing substrate for display device, comprises process chamber with processing space for processing substrate, and substrate support for supporting substrate comprising main component and dielectric layer.
  • 专利号:   KR2021045050-A, KR2277784-B1
  • 发明人:   LEEDONGMOK
  • 专利权人:   SEMES CO LTD
  • 国际专利分类:   H01L021/02, H01L021/67, H01L021/683, C09J011/00, H02N013/00
  • 专利详细信息:   KR2021045050-A 26 Apr 2021 H01L-021/683 202144 Pages: 13
  • 申请详细信息:   KR2021045050-A KR128298 16 Oct 2019
  • 优先权号:   KR128298

▎ 摘  要

NOVELTY - A substrate processing device comprises a process chamber with processing space for processing substrate, and substrate support for supporting the substrate with constant power. The substrate comprises a main component and a dielectric layer which are bonded by adhesive. The adhesive comprises an additive material which is coated by a thermally conductive filler. USE - Device used for processing substrate for display device and semiconductor device. ADVANTAGE - The substrate processing device has excellent heat resistance, thermal conductivity and mechanical property. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the adhesive for substrate processing equipment, which comprises a base material and additive material coated with thermal conductive filler.