• 专利标题:   Chemical vapor deposition monitoring system for use during graphene film preparation process, has feeding and discharging rooms and cover arranged together, where feeding and discharging room are linked to heating furnace baffle and valve.
  • 专利号:   CN203894592-U
  • 发明人:   WEI L, JIANG J
  • 专利权人:   WUXI GEFEI ELECTRONIC THIN FILMS TECHNOL
  • 国际专利分类:   G05B019/05
  • 专利详细信息:   CN203894592-U 22 Oct 2014 G05B-019/05 201503 Pages: 7 Chinese
  • 申请详细信息:   CN203894592-U CN20877948 27 Dec 2013
  • 优先权号:   CN20877948

▎ 摘  要

NOVELTY - One for a kind of graphene film in the CVD monitoring system, comprising, vacuum pump, flow meter, vacuum meter, temperature sensor, control rod, and feedstock material transport system, a PLC control cabinet, data wire and signal wire, controller, flow meter, temperature sensor and heating furnace connected with the vacuum pump, vacuum meter and feedstock chamber, heating furnace and discharging chamber connected, used for respectively and vacuumize the vacuum degree measurement, feedstock and discharging system respectively send the feedstock chamber and discharging chamber, the material sending operation and control rod used for feedstock material transport system and PLC control cabinet through data wire and signal wire and temperature controller, vacuum pump, flow meter, vacuum meter, temperature sensor, control stick in, feedstock chamber and discharging chamber cylinder cover, feedstock chamber, discharging chamber and heating furnace baffle plate valve and connected with processing control. This new utility model can online monitor and store key process parameter and real time waveform and data, automatic degree high, reliability and high stability, strong anti-interference ability strong.