▎ 摘　　要

NOVELTY - A graphene oxide pattern and graphene pattern forming method involves enabling contact between graphene oxide solution and patterning polydimethoxy silane stamp for 1-500 minutes and drying, followed by enabling contact between the dried patterning polydimethoxy silane stamp and a substrate under external force of 0-5N for 1-500 minutes, removing the stamp to form a graphene oxide pattern on the substrate and enabling contact between a patterning polydimethoxy silane stamp, a binding agent and a substrate under external force of 0-5N. The stamp is removed to obtain the substrate. USE - Method for forming a graphene oxide pattern and a graphene pattern. ADVANTAGE - The method enables forming graphene oxide pattern and graphene pattern in a simple and inexpensive manner. DETAILED DESCRIPTION - A graphene oxide pattern and graphene pattern forming method involves enabling contact between graphene oxide solution and patterning polydimethoxy silane stamp for 1-500 minutes and drying, followed by enabling contact between the dried patterning polydimethoxy silane stamp and a substrate under external force of 0-5N for 1-500 minutes, removing the stamp to form a graphene oxide pattern on the substrate and enabling contact between a patterning polydimethoxy silane stamp, a binding agent and a substrate under external force of 0-5N. The stamp is removed to obtain the substrate, followed by enabling contact between the substrate after contact with graphene oxide solution and drying to form a graphene oxide pattern on the substrate.