▎ 摘　　要

NOVELTY - A photolithographically patternable composition comprises a graphene, a natural protein and a solvent. USE - Photolithographically patternable composition. ADVANTAGE - The photolithographically patternable composition has high sensitivity. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a method for preparing composition, which involves mixing a graphene, a natural protein and a solvent to obtain the finished product (2) a photolithographic patterning method, is performed by mixing a graphene, a natural protein, and a solvent uniformly to obtain the composition, applying the composition to a substrate to obtain a substrate having a film formed from the composition on the surface, forming a light source is used to expose and develop the film by utilizing the composition or utilizing laser direct writing and development to obtain the finished product.