▎ 摘　　要

NOVELTY - Method for reducing square resistance of graphene film involves transferring graphene film to substrate, contacting graphene film with reagent containing stable dopant (I)-(V) for 1-240 minutes, forming stabilized pi - pi -overlapped structure, and reducing the square resistance of graphene film. The stable dopant component comprises 2 or more fused rings comprising benzene ring and naphthalene ring connected to chemical agent. USE - Method for reducing square resistance of graphene film used in display device. ADVANTAGE - The method enables reduction of square resistance of graphene film having high light transmittance, and excellent stability for a long period of time. DETAILED DESCRIPTION - Method for reducing square resistance of graphene film involves transferring graphene film to substrate, contacting graphene film with reagent containing stable dopant of formula (I)-(V) Eg: (I)-(III) for 1-240 minutes, forming stabilized pi - pi -overlapped structure, and reducing the square resistance of graphene film. The stable dopant component comprises 2 or more fused rings comprising benzene ring and naphthalene ring connected to chemical agent. R=H, -NO2, -CN, -F, -NH2, -NH-, -N=, -SO3-, or -OSO3; X=C, O, N or S;and Ar'=aryl having coplanar structure.