▎ 摘　　要

NOVELTY - The method involves forming a graphene layer in a substrate. The graphene layer is coated with light sensitive material. Patterning process is performed to obtain a graphene layer image. The graphene layer is provided with a thin film. The thin film is removed. The light sensitive material is exposed into an oxidation graphene layer. The graphene layer is arranged with the substrate. The graphene layer is cleaned by generating ultrasonic wave. An end of a graphite on the substrate is removed. Oxidation process is performed to obtain a graphene thin film. USE - Patterned graphene film manufacturing method. ADVANTAGE - The method enables reducing substrate manufacturing difficulties and increasing processing line width and resolution ratio. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an array base plate. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating a patterned graphene film manufacturing method. '(Drawing includes non-English language text)'