▎ 摘　　要

NOVELTY - Preparing diamond micropowder surface involves adding 10 milliliter deionized water and 20 milliliter hydrofluoric acid solution per gram of diamond. The diamond of 0.05-2 micrometers is placed in a plastic container, and then deionized water and hydrofluoric acid solution and added them in sequence, and ultrasonically washed for 60 minutes, and then allowed to stand for 24 hours. The mixture is subjected to high-speed centrifugation to separate the diamond fine powder and distilled water. The micropowder is washed multiple times until cleaning solution is neutral. The clean diamond micropowder is obtained after drying. The diamond micropowder is placed in a spark plasma sintering system at high temperature vacuum annealing of 1400-1600 degrees C. The annealing time is performed for 5-30 minutes, and is cooled to room temperature to obtain a diamond fine powder in which a graphene layer is grown in situ on the surface. USE - Method for preparing diamond micropowder surface in-situ growing graphene layer. ADVANTAGE - The method enables to prepare diamond micropowder surface which has simple technique, short preparation time. The diamond micro powder surface in situ is controllable thickness and compact combination of graphene and keeps the core structure of diamond.