▎ 摘　　要

NOVELTY - Low-temperature plasma preparation of graphene comprises providing reactor, placing pair of electrodes on opposite ends of reactor, placing metal foil substrate, passing through hydrogen gas, and heating to 500-1000 degrees C to carry out reduction treatment; and passing through carbon source-containing gas and carrier gas, applying voltage across the electrodes, ionizing carbon source-containing gas through capacitive coupled plasma discharge mode for 1-30 minutes, and cooling to room temperature. USE - Method for low-temperature plasma preparation of graphene (claimed). ADVANTAGE - The method is simple, and has low growing temperature of graphene and low cost. The graphene has controllable appearance, good homogeneity, and stable performance.