• 专利标题:   Preparation of fluorinated graphene involves adding graphene to reaction chamber, evacuating pressure inside reaction chamber, passing resultant product through sulfur hexafluoride gas, and performing plasma excitation of gas.
  • 专利号:   CN104986750-A
  • 发明人:   CHENG C, GUO H, LI W, LIU W, LIU X, LU W, MA L, MENG N, SHI T, WAN X, WANG F, WANG X, XU Y, ZHOU H
  • 专利权人:   UNIV ZHEJIANG
  • 国际专利分类:   C01B031/00
  • 专利详细信息:   CN104986750-A 21 Oct 2015 C01B-031/00 201578 Pages: 5 Chinese
  • 申请详细信息:   CN104986750-A CN10361699 26 Jun 2015
  • 优先权号:   CN10361699

▎ 摘  要

NOVELTY - Preparation of fluorinated graphene involves adding graphene sample to sampling indoor and deep reaction etching machine, transferring the sample to pumping chamber at 10-3 Torr or les, and then into reaction chamber, evacuating pressure inside the reaction chamber to 10-6 Torr or less, passing resultant product through sulfur hexafluoride gas at flow rate of 100 sccm, performing plasma excitation of sulfur hexafluoride at 25-300 W for 30 seconds to 20 minutes, and removing the sample. USE - Preparation of fluorinated graphene (claimed). ADVANTAGE - The method enables simple, economical and controllable preparation of fluorinated graphene with high productivity.