• 专利标题:   Reduced graphene oxide coating on silicon based field effect transistors used in biomedical application areas e.g. chemical sensors, has e.g. dispersing reduced graphene oxide in water, and placing polypropylene plate into ultrasonic bath.
  • 专利号:   TR2021008695-A2
  • 发明人:   YILMAZ O, BUDAK E, YILMAZ E, GUERER U
  • 专利权人:   UNIV BOLU ABANT IZZET BAYSAL
  • 国际专利分类:   H01L021/00
  • 专利详细信息:   TR2021008695-A2 21 Jun 2021 H01L-021/00 202348 Pages: 10
  • 申请详细信息:   TR2021008695-A2 TR008695 26 May 2021
  • 优先权号:   TR008695

▎ 摘  要

NOVELTY - Reduced graphene oxide coating on silicon based field effect transistors comprises: dispersing 1-2 mg, preferably 1.5 mg reduced graphene oxide in 1 ml water at 180W, 40 Hz in ultrasonic bath; limiting the area to be covered on the silicon based field effect transistors with aluminum band or mold made of soft material made of silicon derivatives that will not damage the structure of the silicon based field effect transistors; placing the flat plate made of flat polyvinyl chloride or polypropylene into the ultrasonic bath; putting silicon based field effect transistors on it; dropping 10 μ l mixture onto the surface to be coated; operating the system preferably at 180W, 40 Hz for 10-15 minutes; and after removing the solvent part, and keeping at 50° C, preferably 100° C for ≈ one minute. USE - The method is useful for reduced graphene oxide coating on silicon based field effect transistors (claimed), which is used in biomedical application areas e.g. chemical sensors, lithium-ion batteries for energy storage, and drug delivery system for connecting identifier (biomarker) structures. ADVANTAGE - The method: is cost-effective; provides durable coating that does not disappear from the surface of the material afterwards; prevent damage to the photoresist during reduced graphene oxide coating; and destroys chemical residues that do not harm the nature and occur during production.