▎ 摘　　要

NOVELTY - The method involves coating graphene oxide film (20) on a substrate (10). The transparent film is laminated on the graphene oxide and the laser (40) is irradiated on a ring element. The patterning of the graphene oxide is used, where the laser is irradiated in the transparent film direction. The transparent film is removed after the laser irradiation and the graphene pattern is reduced in the transparent film. The transparent film is provided with a polyethylene terephthalate film (30). USE - Method for patterning graphene using laser. ADVANTAGE - The patterning of the graphene oxide is used, where the laser is irradiated in the transparent film direction, and thus enables to implement the graphene circuit of excellent quality without additional patterning process and reduction process. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of a graphene substrate. Substrate (10) Graphene oxide film (20) Polyethylene terephthalate film (30) Laser (40)