• 专利标题:   Water-soluble resin composition useful for forming laser etching protective film on semiconductor element substrate, comprises aqueous polyolefin, water-soluble high molecular polymer, aqueous photoinitiator, adhesion promoter, auxiliary agent, deionized water and filler.
  • 专利号:   CN113444406-A
  • 发明人:   MA X
  • 专利权人:   CHUZHOU JQDK NEW MATERIAL CO LTD WUXI
  • 国际专利分类:   G03F007/20, C09D007/65, C09D123/00
  • 专利详细信息:   CN113444406-A 28 Sep 2021 C09D-123/00 202208 Chinese
  • 申请详细信息:   CN113444406-A CN10370921 07 Apr 2021
  • 优先权号:   CN10370921

▎ 摘  要

NOVELTY - Water-soluble resin composition comprises aqueous polyolefin, water-soluble high molecular polymer, aqueous photoinitiator, adhesion promoter, auxiliary agent, deionized water and filler. USE - The composition is useful for forming laser etching protective film on a semiconductor element substrate (all claimed). ADVANTAGE - The composition: exerts the synergistic effect of multi-component mixed resin; forms protective film having excellent heat resistance, low shrinkage under laser irradiation, high permeability, and low surface roughness; utilizes semiconductor substrates with uneven structure having no gaps; has high absorption rate for deep ultraviolet light with a wavelength less than 355 nm, and clear formed edge of the opening; easily removes protective film; has low energy consumption; can be cleaned up in one scan without residue; and is environmentally friendly, and particularly suitable for laser etching on the surface of semiconductor concave-convex substrates. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) preparing the water-soluble resin composition, comprising mixing aqueous polyolefin and water-soluble high molecular polymer, uniformly stirring at high speed, then adding adhesion promoter, auxiliary agent, deionized water, and filler, continuously stirring and dispersing at high speed; and (2) eliminating the water-soluble resin composition of laser etching protective film, comprising removing the protective film by laser radiation etching.