▎ 摘　　要

NOVELTY - Preparation of composite semiconductor catalyst involves mixing liquid phase exfoliated graphene powder, ferrous chloride, deionized water and 30% hydrogen peroxide, adjusting pH of mixed solution to 4, stirring reaction mixture at 35 degrees C, separating solid by suction filtration, rinsing with ethanol and deionized water to obtain hydroxylated graphene, dissolving hydroxylated graphene in absolute ethanol and deionized water in volume ratio of 1:2 to obtain mixed solution (A), ultrasonically processing, adding and stirring precursor material for 2-4 hours to obtain mixed solution (B), stirring evenly, feeding to hydrothermal reactor containing PTFE, carrying out hydrothermal reaction at 120-180 degrees CC for 3-8 hours, washing hydrothermal solid product with anhydrous ethanol and deionized water several times, vacuum drying at 40-60 degrees C for 18-24 hours and obtaining reduced hydroxylated graphene. USE - Preparation of composite semiconductor catalyst used in photocatalytic reactions e.g. degradation of organic matter, hydrogen production by photolysis of water, and reduction of carbon dioxide (all claimed). ADVANTAGE - The method provides composite semiconductor catalyst having effectively improved catalytic activity, in one step. The obtained nano-catalyst has small particle size, and can be stably dispersed on the surface of reduced hydroxylated graphene, and has high photocatalytic performance. After reduction, the hydroxylated graphene has excellent integrity and electron transport performance. When using hydroxylated graphene as a carrier material for rapid transfer of photogenerated electrons, the recombination rate of photogenerated electrons and holes in a semiconductor material can be effectively reduced, thereby improving the photocatalytic efficiency. The precursor used in nontoxic and economical.