▎ 摘　　要

NOVELTY - Preparing rGO/silicon dioxide coating on aluminum-magnesium-silicon alloy plate surface, comprises: (1) taking 0.8 to 1.2 wt.% magnesium, 0.4 to 0.8 wt.% silicon, the balance of aluminium and unavoidable impurity; (2) selecting the polar plate with the size of 1.5 mm*1.5 mm*0.25 mm; and using the computer engraving technology to engrave the single channel snake-shaped flow field for future use; (3) sequentially putting the aluminium alloy plate in the ethanol and acetone, sequentially cleaning for 5-10 minutes, finally, deionized water cleaning for 5-10 minutes, drying in the vacuum drying box at 100℃, where the polar plate is 400 #, 1000 #, 2000 #, 5000 # of sand paper; (4) dissolving 5 g polyvinyl alcohol in 95g deionized water, raising the temperature to 75-85℃, using magnetic stirrer continuously, until the polyvinyl alcohol is completely dissolved, preparing the polyvinyl alcohol solution. USE - Method for preparing rGO/silicon dioxide coating on aluminum-magnesium-silicon alloy plate surface. ADVANTAGE - The method enhance adhesion between aluminum-magnesium-silicon and GO/silicon dioxide by generating hydrophilic surface thin film on surface of aluminum-magnesium-silicon alloy polar plate; forms uniform and firm interface in the dip coating method without generating pores or defects; reduces the defect in the coating, and enhances the corrosion resistance of the alloy material. The method has simple technique, low cost, and it has great utility and popularization value. DETAILED DESCRIPTION - Preparing rGO/silicon dioxide coating on aluminum-magnesium-silicon alloy plate surface, comprises: (1) taking 0.8 to 1.2 wt.% magnesium, 0.4 to 0.8 wt.% silicon, the balance of aluminium and unavoidable impurity; (2) selecting the polar plate with the size of 1.5 mm*1.5 mm*0.25 mm; and using the computer engraving technology to engrave the single channel snake-shaped flow field for future use; (3) sequentially putting the aluminium alloy plate in the ethanol and acetone, sequentially cleaning for 5-10 minutes, finally, deionized water cleaning for 5-10 minutes, drying in the vacuum drying box at 100℃, where the polar plate is 400 #, 1000 #, 2000 #, 5000 # of sand paper; (4) dissolving 5 g polyvinyl alcohol in 95g deionized water, raising the temperature to 75-85℃, using magnetic stirrer continuously, until the polyvinyl alcohol is completely dissolved, preparing the polyvinyl alcohol solution with mass fraction of 5 % for further use; (5) dissolving 5 g sodium polyacrylate in 95g, deionized water the temperature to 75-85℃, using magnetic stirrer stirring continuously, until the sodium polyacrylate is completely dissolved, preparing sodium polyacrylate solution with mass fraction of 5 % for further use, and deionizing water of the 40 % glyoxal solution to 1 %; (6) taking 5 % polyvinyl alcohol solution 0.2-0.3g, 5 % sodium polyacrylate solution 0.1-0.15 g, 5 % glyoxal solution 0.15-0.25g, the balance of deionized water, and preparing 100 g hydrophilic film mixed solution; (7) soaking the polar plate after removing oil and impurity in the hydrophilic film solution for 120-80 minutes, and generating a layer of hydrophilic film on the surface of the polar plate and a large amount of hydroxyl which can be absorbed on the functional graphene; (8) stirring the graphene powder by magnetic stirrer 10-20 minutes, where the heating temperature is 45-55℃, making it uniformly dispersed in the ethanol solution, obtaining the graphene turbid liquid, then adding nanometer silicon dioxide particles containing amino group, magnetically stirring for 20-30 minutes, then dispersing again by ultrasonic, standing for 5-10 minutes; (9) soaking the electrode plate after soaking to generate hydrophilic film into GO/silicon dioxide suspension, soaking time is 60-120 minutes, preparing aluminum-magnesium-silicon alloy plate coated with GO/silicon dioxide coating; (10) annealing 120 to 180 minutes to remove the hydrophilic coating, where the polar plate in the vacuum is 300 to 350℃, then in the mixed gas of nitogen and hydrogen to 300 to 350℃ and then annealing for 120 to 180 minutes to reduce GO, generating aluminum-magnesium-silicon alloy plate covered with rGO/silicon dioxide coating.