• 专利标题:   Preparing graphene oxide/silicon dioxide humidity sensitive material, comprises providing silicon dioxide microspheres, using poly(diallyldimethylammonium chloride) to modify surface of silicon dioxide microsphere to obtain modified silicone dioxide micro-sphere.
  • 专利号:   CN115468989-A
  • 发明人:   LI J, LI G, HUANG Y
  • 专利权人:   UNIV SOUTHWEST
  • 国际专利分类:   G01N027/12
  • 专利详细信息:   CN115468989-A 13 Dec 2022 G01N-027/12 202301 Chinese
  • 申请详细信息:   CN115468989-A CN11127521 16 Sep 2022
  • 优先权号:   CN11127521

▎ 摘  要

NOVELTY - Preparing graphene oxide/silicon dioxide (GO/SiO2) humidity sensitive material, comprises providing silicon dioxide microspheres, using poly(diallyldimethylammonium chloride) (PDDA) to modify the surface of the silicon dioxide microsphere to obtain a modified silicone dioxide micro-sphere, and covering the modified silicon dioxide micro sphere by GO to obtain the GO/SiO2humidity-sensitive material. USE - Method for preparing graphene oxide/silicon dioxide humidity sensitive material. ADVANTAGE - The method is simple in preparation process, has high sensitivity, and fast response and recovery characteristics, and applied to agricultural humidity detection. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a humidity sensor which comprises the GO/SiO2 humidity sensitive material.