• 专利标题:   Removing arsenic in hydrofluoric acid involves adding graphene nano sheet in the sulfuric acid-nitric acid mixed solution, dispersing and stirring the mixture, heating the stirred mixture, and then filtering the mixture.
  • 专利号:   CN108178127-A
  • 发明人:   LIAO Z, LAI S, KANG H
  • 专利权人:   XUANCHENG HENGWANG NEW MATERIALS CO LTD
  • 国际专利分类:   C01B007/19
  • 专利详细信息:   CN108178127-A 19 Jun 2018 C01B-007/19 201856 Pages: 5 Chinese
  • 申请详细信息:   CN108178127-A CN10163785 27 Feb 2018
  • 优先权号:   CN10163785

▎ 摘  要

NOVELTY - Removing arsenic in hydrofluoric acid involves adding graphene nano sheet in the sulfuric acid-nitric acid mixed solution. The mixture is dispersed and stirred. The stirred mixture is heated for 6-12 hours. The mixture is filtered, and then rinsed with de-ionized water; to obtain oxidized graphene nano sheet. Dispersant and ferrous sulfate are added into ethanol solution, respectively stirring to completely dissolve, obtaining mixed solution. The oxidized graphene nano sheet is added into mixed solution. The mixture is ultrasonically dispersed for 2-6 hours. The mixture is dried at 50-60 degrees C after filtering and washing with absolute ethanol to obtain the modified graphene oxide. The obtain the modified graphene oxide sheet is added to the arsenic-containing hydrofluoric acid. The product is sealed and stirred for 1-24 hours. The product is filtered. USE - Method for removing arsenic in hydrofluoric acid. ADVANTAGE - The method enables to remove arsenic in hydrofluoric acid in a simple, safe and easy manner.