• 专利标题:   Method for preparing graphene-coated stainless steel array microporous fiber, involves deoxidizing graphene oxide-coated fibers in mixed solution of ultrapure water, hydrazine hydrate and ammonium hydroxide to obtain graphene-coated.
  • 专利号:   CN114990683-A
  • 发明人:   YANG M, SHEN X, LI Z, LI B
  • 专利权人:   UNIV NORTH CHINA ELECTRIC POWER
  • 国际专利分类:   C23C028/04, C25F003/06
  • 专利详细信息:   CN114990683-A 02 Sep 2022 C25F-003/06 202285 Chinese
  • 申请详细信息:   CN114990683-A CN10633205 06 Jun 2022
  • 优先权号:   CN10633205

▎ 摘  要

NOVELTY - The method involves smoothing the stainless steel fibers, then the surface organics are ultrasonically removed in methanol and acetone, respectively, rinse with ultrapure water, and dry under nitrogen. The ends of the stainless steel fibers are etched in an electrochemical etching system. The etched end is soaked in NaOH solution, rinse with ultrapure water and dry in an oven, after etching, wash with ultrapure water and dry in an oven. The pretreated stainless steel fibers are immersed in the coupling agent/MeOH mixed solution, and then oven-dried to obtain amino-functionalized SSF, namely SSF-NH2. The SSF-NH2 is immersed in the graphene oxide dispersion, and then dry it at room temperature. The graphene oxide-coated fibers are deoxidized in a mixed solution of ultrapure water, hydrazine hydrate and ammonium hydroxide to obtain graphene-coated SSF, namely SSF-GF. USE - Method for preparing graphene-coated stainless steel array microporous fiber (claimed). ADVANTAGE - The four-electrode metal etching device is adopted to generate dense array micropores on the surface of the stainless steel fiber, more anchor points for the reaction is provided, so that the coating material is chemically bonded in the micropore, the durability of the coating is improved, the friction loss is reduced, and the stability of the chemical bond is used to enhance the stability of the graphene coating using the method of chemical bonding. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of electrochemical etching system.