• 专利标题:   Method for depositing chemical vapor for transferring graphene film, involves connecting bottom plate fixedly with fixed column, and providing square block and square concave block corresponding to hole.
  • 专利号:   CN204474755-U
  • 发明人:   SHAO L, SHI H, YU J, ZHANG P, ZHONG D
  • 专利权人:   CHONGQING MOXI TECHNOLOGY CO LTD, CHINESE ACAD SCI CHONGQING GREEN INTEL
  • 国际专利分类:   C23C016/01, C23C016/26
  • 专利详细信息:   CN204474755-U 15 Jul 2015 C23C-016/26 201566 Pages: 7 Chinese
  • 申请详细信息:   CN204474755-U CN20776045 11 Dec 2014
  • 优先权号:   CN20776045

▎ 摘  要

NOVELTY - The new type utility claims have one plant chemistry gas phase depositing method for graphene film transfer tool and device, comprising a bottom plate, the bottom plate and fixedly connected with the fixing column, lower clamp and upper clamp, lower clamp is a square block, two corresponding edge set with hole, the concave for etching liquid flow to enter for etching catalytic base, upper clamp is length and width size is a square block, square block and square block identical, square block upper and square concave block in each corresponding to the position set with hole, the hole can be through fixed column. The utility model is new type can at the same time with the graphene thin film to more growing of the catalytic substrate for etching, increase production efficiency, at the same time tool device with simple structure, easy to manufacture and use.