• 专利标题:   Graphene transistor e.g. FET for high frequencies, has gate electrode that is formed while forming source electrode in one edge, and drain electrode on other edge of insulator.
  • 专利号:   JP2008205272-A, JP5135825-B2
  • 发明人:   HIROSE S, IWAI D
  • 专利权人:   FUJITSU LTD
  • 国际专利分类:   H01L021/336, H01L029/786
  • 专利详细信息:   JP2008205272-A 04 Sep 2008 H01L-029/786 200862 Pages: 16 Japanese
  • 申请详细信息:   JP2008205272-A JP040775 21 Feb 2007
  • 优先权号:   JP040775

▎ 摘  要

NOVELTY - The transistor has graphene (3) that is formed on the insulator (2) provided on the substrate (1), in the growth process of carbon nanotube. A gate electrode (6) is formed while forming source electrode (4) in one edge, and drain electrode (5) on the other edge of insulator. The catalyst such as titanium nitride/cobalt is used for the growth of carbon nanotube. USE - Graphene transistor such as FET for high frequencies. Can also be used in transistor for electric power, insulated gate transistor, schottky barrier gate-type transistor, etc. ADVANTAGE - Graphene of single layer can be removed easily. Mass production of small sized high speed transistor can be enabled. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing method of graphene transistor. DESCRIPTION OF DRAWING(S) - The drawing shows the sectional view of graphene transistor. (Drawing includes non-English language text) Substrate (1) Insulator (2) Graphene (3) Source electrode (4) Drain electrode (5) Gate electrode (6)